Ultrafast lasers solved the quality problem. Throughput is the remaining one
Beam splitting, polygon scanning and higher repetition rates are the levers turning femtosecond precision into production volume.

Femtosecond and picosecond processing earned its reputation on a single physical advantage: pulses short enough that material is removed before heat can diffuse into the surrounding structure. The result is machining with almost no recast layer, no microcracking and no thermal damage to adjacent features — the reason ultrafast systems dominate glass cutting for displays, microvia drilling and work on medical polymers and semiconductors.
That advantage was never in doubt. The obstacle has always been rate.
Why average power alone did not fix it
Ultrafast sources have climbed steadily in average power, but simply putting more power into the same spot does not scale ablation. Above a modest fluence, additional energy per pulse is increasingly lost to plasma shielding and to the very heat accumulation the process exists to avoid. Push harder and the quality advantage disappears — which is the whole reason for choosing the technology.
The workable path is therefore not a bigger pulse but more pulses, spread across space and time.
Three levers
Beam splitting. Diffractive optics and spatial light modulators divide one high-power beam into many parallel spots, each operating at a fluence in the efficient regime. For repetitive patterns — perforation arrays, texturing, via fields — this multiplies throughput almost linearly with spot count.
Faster scanning. Galvanometer scanners have a mechanical ceiling. Polygon scanners, which sweep the beam with a rotating mirror, reach line speeds far beyond that, allowing very high repetition rates to be laid down without pulses overlapping into thermal accumulation.
Repetition rate with synchronised motion. Megahertz-class sources only help if the beam is moving fast enough that consecutive pulses land on fresh material. Rate, scan speed and spot spacing have to be designed together; raising any one alone degrades the result.
Where this lands commercially
The applications pulling hardest are the ones where nothing else works and volumes are large: display glass cutting and edge strengthening, wafer dicing where mechanical sawing damages low-k layers, precision texturing, and microfluidic and medical device features too small or too delicate for thermal processes.
The engineering conversation has moved accordingly. Vendors increasingly compete on scanner architecture, beam delivery and motion synchronisation rather than on pulse duration figures. The pulse was never the bottleneck. Getting enough of them onto the part, in the right places, is.
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